1111 - 薄膜工程

Thin Film Engineering

教育目標 Course Target

本課程的內容規畫將由建立製作薄膜的真空系統基礎概念開始,進而理解薄膜製作的物理及化學各種製程的背景知識,學習各種薄膜的檢測與分析技術,最後建立博末工程在半導體、光學及光電等領域應用的知識。
本課程教授目標旨在為學生奠定薄膜工程的扎實基礎。我們將從真空系統與薄膜成長原理開始,深入探討物理氣相沉積(PVD)與化學氣相沉積(CVD)等核心製程技術。課程也涵蓋薄膜結構、物性與電性的檢測與分析方法,並探討導體、介電、導電、光學薄膜在電子、光電產業的應用。我期望學生能透過本課程,具備獨立設計與製備薄膜,並解決相關工程問題的能力。

The content planning of this course will start from establishing the basic concepts of the vacuum system for making thin films, then understanding the background knowledge of various physical and chemical processes of thin film making, learning the detection and analysis techniques of various thin films, and finally establishing the knowledge of the application of Bomo engineering in the fields of semiconductors, optics and optoelectronics.
The teaching goal of this course is to lay a solid foundation for students in thin film engineering. We will start with the vacuum system and thin film growth principles, and then delve into core process technologies such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). The course also covers detection and analysis methods of thin film structure, physical properties and electrical properties, and discusses the application of conductors, dielectrics, conductive and optical films in the electronics and optoelectronics industries. I hope that students can develop the ability to independently design and prepare thin films and solve related engineering problems through this course.

課程概述 Course Description

本課程旨在為學生建立電機電子領域的所需薄膜工程的製作與應用知識,本課程首先簡介真空系統原理與技術,接著介紹薄膜製作的物理氣相沉積(PVD)法與化學氣相沉積(CVD)法,含括其基礎原理、製作參數及製程設備之實務技術、薄膜之結構、物性及電性的檢測與分析方法,最後再介紹薄膜相關主題的半導體薄膜、光學薄膜、導電薄膜、介電薄膜。

This course aims to provide students with the production and application knowledge of thin film engineering required in the field of electrical and electronics. This course first introduces the principles and technologies of vacuum systems, and then introduces the physical vapor deposition (PVD) method and chemical vapor deposition (CVD) method of thin film production, including its basic principles, production parameters and practical technology of process equipment, and detection and analysis methods of thin film structure, physical properties and electrical properties. Finally, it introduces thin film-related topics such as semiconductor films, optical films, conductive films, and dielectric films.

參考書目 Reference Books

1.國家實驗研究院,真空技術與應用,國家儀器科技研究中心。
2.李景光,真空技術基礎, 4th EDITION, McGraw-Hill.
3.金原粲,薄膜工程學,全華圖書。

1. National Experimental Research Institute, Vacuum Technology and Application, National Instrument Science and Technology Research Center.
2. Li Jingguang, Fundamentals of Vacuum Technology, 4th EDITION, McGraw-Hill.
3. Jin Yuancan, Thin Film Engineering, Quanhua Books.

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課程資訊 Course Information

基本資料 Basic Information

  • 課程代碼 Course Code: 1111
  • 學分 Credit: 0-3
  • 上課時間 Course Time:
    Monday/2,3,4
  • 授課教師 Teacher:
    楊尚霖
  • 修課班級 Class:
    電機系3,4
選課狀態 Enrollment Status

目前選課人數 Current Enrollment: 0 人

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